The JetFirst system is a lamp furnace that has been developed to meet the requirements of universities and research laboratories. The temperature measurement control system provides accurate and repeatable thermal control across the temperature range. The lamp array, upper ﬂange, and quartz window are mounted in a rotating top lid, giving full access to the chamber for easy loading and unloading of the wafer.
Silicon carbide coated graphite susceptors are available for the processing of various small samples and compound semi materials. A spare process chamber can be provided upon request to avoid cross contamination if several processes have to be performed in the same reactor. The high reliability and high performance characteristics of the JetFirst enable small-scale production.
The process can take place at atmospheric pressure or under vacuum. A PID system provides accurate and repeatable thermal control across the temperature range. RTP Process control is via computer, running PIMS dedicated supervisor that enables recipe programming and monitoring of the entire RTP system.